Semiconductor and Electronics

Analyzers for Ultra-high Purity Gas Quality Control for Semiconductor Manufacture

Essential Trace Impurity Detection and Control for Semiconductor Manufacture

The specialty gases used in manufacturing semiconductors must be high purity because of the detailed precision of the process. Even the presence of trace impurities measured in parts per trillion will result in the loss of whole batches of wafers. Reliable, repeatable measurements of key parameters with lower detection limits down to <100 ppt are essential in these applications.

A Single Supplier for All Your Measurement Requirements

We offer you reliable measurements of all critical trace impurities with low detection levels to parts per billion for many parameters. You benefit from the convenience and peace of mind with a complete solution from a single supplier. Multiple trace impurity measurements are also possible with a single analyzer system for even greater convenience.

A Complete Solution to Monitor and Control Trace Impurities in Specialty Gases

Our oxygen and moisture analyzers and sensors, together with process gas chromatographs, provide a complete solution to monitor and control the purity of inert gases, specialty gases and toxic gases such as: nitrogen (N2), helium (He), argon (Ar), oxygen (O2), hydrogen (H2), tungsten hexafluroride (WF6), octafluorocyclobutane (C4F8), silane (SiH4), germane (GEH4), nitrous oxide (N2O), and nitrogen trifluroride (NF3).

Product Selector

Trace O2 in UHP Gases

Application/Service Measurement Range Measured Gas/Background Gas Recommended Product
Monitoring Oxygen Contamination of UHP Gases 0-100ppb N2, H2, Ar PI2-UHP100 & PI2-MS1000
Monitoring Oxygen Contamination of UHP H2 scavenger gases used in atmosphere soldering and annealing copper films. 0-100ppb O2 N2, H2, Ar PI2-UHP100 & PI2-MS1000

Moisture Contamination in UHP gases

Application/Service Measurement Range Measured Gas/Background Gas Recommended Product
Monitoring Oxygen Contamination of UHP Gases 0-100 ppbV H2O
0-10 ppmV H2O
50 ppmV H2O
100 ppmV H2O
-120 to -40°C dew point
Fully fluronated compounds (FFCs), N2, H2, Ar etc QMA401
Pura-TX-2WS800-RS

Confirming Purity of UHP Gases

Application/Service Measurement Range Measured Gas/Background Gas Recommended Product
Confirming the Purity of UHP Gases 85-100ppt H2, N2, CH4, CO, NMHC, Ar/He, Ar, O2, MultiDetek2

Process Monitoring & Control

Application/Service Measurement Range Measured Gas/Background Gas Recommended Product
Heat Treating Silicon Wafers – Monitoring Trace Oxygen in Wafer Oxidation Furnaces 0-10 ppm O2 N2, H2 GPR-1600
GPR-1200
Inerting in Solder Reflow Ovens and Wafer Fabrication <10 ppm O2 N2 Microx
Cleaning Pocesses in Chemical Vapor Deposition Chambers – Monitoring Moisture Levels After Purging with High Purity Nitrogen. 0-100 ppmV H2O
0-10 ppmV H2O
50 ppmV H2O
100 ppmV H2O
-120 to -40 °C
N2 Pura-TX-2W
QMA401

Ambient Oxygen Monitoring

Application/Service Measurement Range Measured Gas/Background Gas Recommended Product
Ambient Monitoring for Personnel Safety - Personnel Protection Against O2 Deficiency in Confined Spaces <19.5-20.0% Air, N2 Gasenz

Selected Applications

Sample Gas Impurites

Limit of Detection

NOTE: Noise level is based on the peak noise values using a Helium blank gas.