The specialty gases used in manufacturing semiconductors must be high purity because of the detailed precision of the process. Even the presence of trace impurities measured in parts per trillion will result in the loss of whole batches of wafers. Reliable, repeatable measurements of key parameters with lower detection limits down to <100 ppt are essential in these applications.
We offer you reliable measurements of all critical trace impurities with low detection levels to parts per billion for many parameters. You benefit from the convenience and peace of mind with a complete solution from a single supplier. Multiple trace impurity measurements are also possible with a single analyzer system for even greater convenience.
Our oxygen and moisture analyzers and sensors, together with process gas chromatographs, provide a complete solution to monitor and control the purity of inert gases, specialty gases and toxic gases such as: nitrogen (N2), helium (He), argon (Ar), oxygen (O2), hydrogen (H2), tungsten hexafluroride (WF6), octafluorocyclobutane (C4F8), silane (SiH4), germane (GEH4), nitrous oxide (N2O), and nitrogen trifluroride (NF3).
| Application/Service | Measurement Range | Measured Gas/Background Gas | Recommended Product |
|---|---|---|---|
| Monitoring Oxygen Contamination of UHP Gases | 0-100ppb | N2, H2, Ar | PI2-UHP100 & PI2-MS1000 |
| Monitoring Oxygen Contamination of UHP H2 scavenger gases used in atmosphere soldering and annealing copper films. | 0-100ppb O2 | N2, H2, Ar | PI2-UHP100 & PI2-MS1000 |
| Application/Service | Measurement Range | Measured Gas/Background Gas | Recommended Product |
|---|---|---|---|
| Monitoring Oxygen Contamination of UHP Gases | 0-100 ppbV H2O 0-10 ppmV H2O 50 ppmV H2O 100 ppmV H2O -120 to -40??C dew point |
Fully fluronated compounds (FFCs), N2, H2, Ar etc | QMA401 Pura-TX-2WS800-RS |
| Application/Service | Measurement Range | Measured Gas/Background Gas | Recommended Product |
|---|---|---|---|
| Confirming the Purity of UHP Gases | 85-100ppt | H2, N2, CH4, CO, NMHC, Ar/He, Ar, O2, | MultiDetek3 |
| Application/Service | Measurement Range | Measured Gas/Background Gas | Recommended Product |
|---|---|---|---|
| Heat Treating Silicon Wafers ??? Monitoring Trace Oxygen in Wafer Oxidation Furnaces | 0-10 ppm O2 | N2, H2 | GPR-1600 GPR-1200 |
| Inerting in Solder Reflow Ovens and Wafer Fabrication | <10 ppm O2 | N2 | Microx |
| Cleaning Pocesses in Chemical Vapor Deposition Chambers ??? Monitoring Moisture Levels After Purging with High Purity Nitrogen. | 0-100 ppmV H2O 0-10 ppmV H2O 50 ppmV H2O 100 ppmV H2O -120 to -40 ??C |
N2 | Pura-TX-2W QMA401 |
| Application/Service | Measurement Range | Measured Gas/Background Gas | Recommended Product |
|---|---|---|---|
| Detection and measurement of nitrous oxide | 0-1000ppm | N2O | Nitrous Oxide Infrared Sensors - Dynament Platinum Series
Nitrous Oxide Infrared Gas Sensors - Dynament Standard Series |
NOTE: Noise level is based on the peak noise values using a Helium blank gas.
